Nsf Grant #0755995 Nsf Program Name: Nanomanufacturing

This technical paper reports progress on two fronts on the proposed research in the field of Nanoxerography. Aspect 1 reports on a new nanolens approach on the basis of charged resist structures to print nanoparticles with high resolution – a 3 fold size reduction has been observed between the structures and the assembled particles. Directed assembly was observed due to a naturally occurring inbuilt charge differential at the material interface which was further enhanced by corona charging to yield a field strength exceeding 1 MV/m in Kelvin Probe Force Microscopy (KFM) measurements. The assembly process is independent of the nanomaterial source and type – an evaporative, plasma, and electrospray source have been tested to deposit silicon and metallic nanoparticles. Aspect 2 reports on a new approach to produce high resolution charge patterns using a process that can be scaled to large areas since prior processes were limited to cm sized substrates. A new process was discovered that can potentially scale Nanoxerography to large area printing and possibly roll-to-roll processing. While an extension to roll-to-roll is outside of the scope of the proposed work we decided to include preliminary results on the process in this report. The process is called Nanocontact Electrification and uses forced delamination of insulating surfaces which result in uncompensated surface charges. The process produces charged surfaces and associated fields that exceed the breakdown strength of air leading to strong long range adhesive forces and force distance curves which are recorded over macroscopic distances. The process is applied to fabricate charge patterned surfaces for nanoxerography demonstrating 200nm resolution nanoparticle prints and applied to thin film electronics where the patterned charges are used to shift the threshold voltages of underlying transistors. Aspect 1: Nanoxerography Exploring Fringing Fields and Electrodynamic Nanolens 1.